Micro-Nano Manufacturing Center

CMNF
Information and communication technology Platform Numeric for human

Our platform enables the fabrication of advanced components and systems in various fields such as (bio)MEMS, photonics, power components, high frequency/high throughput devices, micro-energy or acoustics. It is one of the 5 major French academic centers. Our expertise is recognized nationally and internationally in various fields such as electronic lithography or ion implantation. Composed of about twenty qualified engineers and technicians working in close collaboration with researchers, our team works on the most ambitious projects related to micro and nanotechnologies. We are structured around major areas of expertise: Growth and deposition of thin films, Lithography, Etching, Ion Implantation, Process Characterization, Assembly-Prototyping, and BioMicrofluidics. As a member of the RENATECH network (national network of large-scale micro-nanofabrication facilities), we can respond to any request for the development of technological components or the fabrication of devices from other companies or institutes.

Informations

Technical director: Bertrand Grimbert
Scientific director: Christophe Lethien

https://www.iemn.fr/plates-formes/cmnf

Avenue Henri Poincaré
Campus Cité scientifique
59650 VILLENEUVE D'ASCQ

Mots-clés

Lithography, Etching, Ion Implantation, Bio-microfluidics, Clean room (ISO6), Renatech network, Nanofabrication, Nanoelectronics, Photonics, Flexible electronics, Microsystem, Thin film deposition

Localisation

  • Micro-devices and electronic components
  • Deposition of materials, structuring of these materials by lithography / etching and in-line analysis
  • Thin film deposition (metals, oxides, nitrides) by PVD (physical vapor deposition) and CVD (Chemical Vapor Deposition: AP CVD, LP CVD, PE CVD) 
  • Atomic layer deposition by thermal ALD and plasma
  • Biomicrofluidics
  • Soft lithography
  • Optical and electronic lithography
  • Chemical etching / Physical plasma etching / Ion implantation
  • Epitaxial growth by Molecular Beam Epitaxy
  • Laser structuring

Examples of projects:

  • Power transistor
  • Photonic emission and reception components
  • RF and THz components
  • Microsource of energy
  • MEMS, BIOMEMS
  • Technological manufacture of micro-devices and electronic components
  • Manufacture, characterization and use of biomimetic devices (microfluidic equipment, etc.)
  • Material deposition (by evaporation, by sputtering, by atomic layer, thermal deposition, plasma deposition at low temperature)
  • Inkjet printing
  • Growth of III-V materials (Ga, As, Sb, ...)
  • Material characterization
  • Structuring of materials by lithography / etching and in-line analysis
  • Optical lithography
  • Electronic lithography
  • Chemical etching
  • Inductive plasma etching
  • Reactive ionic etching
  • Assembly-Assembly
  • Prototyping and development of demonstrators

The CMNF platform covers 1600m² of ISO6 certified clean room and an additional 260m² dedicated to the back-end. The center has a wide range of equipment ranging from the basics of the semiconductor industry to advanced micro-nanofabrication equipment. The total value of the equipment is approximately €30 million and includes equipment dedicated to specific stages of the technological process: laser lithography tools, electron beam equipment, deep engraving equipment, processing chambers, ion implanter, evaporation and sputtering tools, tube furnaces, optical microscopes, high resolution microscopes, polishing equipment, wafer cuts, welds and many more.

See the detailed list of equipment.

INSA Lyon, Institut de Chimie et des Matériaux Paris-Est (ICMPE), Institut de Minéralogie, de Physique des Matériaux et de Cosmochimie (IMPMC), Chimie des processus biologiques - Collège de France, Institut Jean Lamour, Institut de Physique Nucléaire de Lyon, Université Claude Bernard Lyon, Université du Littoral Côte d'Opale, Université Montpellier
MIT (USA)

Back